Open Source EUV Lithography Simulator — from plasma source to CD metrology. Full-stack simulation: LPP Sn plasma → RCWA mask diffraction → TMM multilayer optics → Hopkins aerial imaging → Dill ABC resist chemistry → CD metrology. Apache 2.0.
python open-source simulation pytorch scientific-computing optics plasma-physics lithography semiconductor photonics rcwa fastapi euv computational-lithography resist-modeling euv-lithography semiconductor-simulation hopkins-imaging dill-model multilayer-optics
-
Updated
Jul 22, 2026 - Jupyter Notebook