Open Source EUV Lithography Simulator — from plasma source to CD metrology. Full-stack simulation: LPP Sn plasma → RCWA mask diffraction → TMM multilayer optics → Hopkins aerial imaging → Dill ABC resist chemistry → CD metrology. Apache 2.0.

Scaling a CUDA-Q GQE + QSCI pipeline to 40 qubits for EUV photoresist chemistry: generative quantum eigensolver circuits, quantum-selected configuration interaction, and real-QPU runs on tin-based resist molecules.

High-Fidelity Fuel Targeting and Deterministic Combustion — Adapting EUV Lithography Tin Droplet Architectures to Advanced Marine and Motorsport Propulsion